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Watermark formation mechanism by evaporation of ultra-pure water: Study the effect of ambient

dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-21T12:34:50Z
dc.date.available2021-10-21T12:34:50Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23150
dc.sourceIIOimport
dc.titleWatermark formation mechanism by evaporation of ultra-pure water: Study the effect of ambient
dc.typeMeeting abstract
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2116
dc.source.conference224th Electrochemical society meeting, 13th International Symposium on Semiconductor Cleaning Science and Technology (SCST13)
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://ma.ecsdl.org/content/MA2013-02/30/2116.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; Vol. MA2013-02


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