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dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorRio, David
dc.contributor.authorLiu, H.
dc.contributor.authorGillijns, Werner
dc.contributor.authorWang, Jing
dc.contributor.authorWong, Patrick
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorWiaux, Vincent
dc.contributor.authorNikolsky, Peter
dc.contributor.authorFinders, Jo
dc.date.accessioned2021-10-21T12:44:13Z
dc.date.available2021-10-21T12:44:13Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23169
dc.sourceIIOimport
dc.titleImaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
dc.typeProceedings paper
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.source.peerreviewno
dc.source.beginpage88860N
dc.source.conference29th European Mask and Lithography Conference
dc.source.conferencedate25/06/2013
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1746550
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8886


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