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Characterization and optimization of positive tone DUV resists on TiN substrates

dc.contributor.authorZandbergen, Peter
dc.contributor.authorGehoel-van Ansem, W.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorVloeberghs, H.
dc.date.accessioned2021-09-30T10:10:18Z
dc.date.available2021-09-30T10:10:18Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2319
dc.sourceIIOimport
dc.titleCharacterization and optimization of positive tone DUV resists on TiN substrates
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage314
dc.source.endpage323
dc.source.conferenceAdvances in Resist Technology and Processing XIV
dc.source.conferencedate10/03/1997
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access


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