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Roughness and variability in EUV lithography: Who is to blame? (Part 1)

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorWinroth, Gustaf
dc.contributor.authorBiafore, John
dc.contributor.authorAnno, Yusuke
dc.contributor.authorHoshiko, Kenji
dc.contributor.authorConstantoudis, Vassilios
dc.date.accessioned2021-10-21T13:04:44Z
dc.date.available2021-10-21T13:04:44Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23210
dc.sourceIIOimport
dc.titleRoughness and variability in EUV lithography: Who is to blame? (Part 1)
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage86792O
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1675310
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 8679


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