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Cleaning of III-V materials: surface chemistry considerations

dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorCuypers, Daniel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T13:22:46Z
dc.date.available2021-10-21T13:22:46Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23247
dc.sourceIIOimport
dc.titleCleaning of III-V materials: surface chemistry considerations
dc.typeProceedings paper
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage98
dc.source.endpage99
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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