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High throughput grating qualification of directed self-assembly patterns using optical metrology
Publication:
High throughput grating qualification of directed self-assembly patterns using optical metrology
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Date
2013
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27373.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Look, Lieve
;
Rincon Delgadillo, Paulina
;
Lee, Yu-tsung
;
Pollentier, Ivan
;
Gronheid, Roel
;
Cao, Yi
;
Lin, Guanyang
;
Nealey, Paul F.
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1931
since deposited on 2021-10-21
Acq. date: 2025-12-11
Citations
Metrics
Views
1931
since deposited on 2021-10-21
Acq. date: 2025-12-11
Citations