Show simple item record

High throughput grating qualification of directed self-assembly patterns using optical metrology

dc.contributor.authorVan Look, Lieve
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorLee, Yu-tsung
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGronheid, Roel
dc.contributor.authorCao, Yi
dc.contributor.authorLin, Guanyang
dc.contributor.authorNealey, Paul F.
dc.date.accessioned2021-10-21T13:30:55Z
dc.date.available2021-10-21T13:30:55Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23264
dc.sourceIIOimport
dc.titleHigh throughput grating qualification of directed self-assembly patterns using optical metrology
dc.typeOral presentation
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference39th International Conference on Micro and Nano Engineering - MNE
dc.source.conferencedate16/09/2013
dc.source.conferencelocationLondon UK
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
27373.pdf
Size:
2.570Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record