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Advanced PECVD SiCOH low-k films with low dielectric constant and/or high Young�s modulus

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorWang, Cong
dc.contributor.authorSouriau, Laurent
dc.contributor.authorVanstreels, Kris
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T14:02:47Z
dc.date.available2021-10-21T14:02:47Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23326
dc.sourceIIOimport
dc.titleAdvanced PECVD SiCOH low-k films with low dielectric constant and/or high Young�s modulus
dc.typeMeeting abstract
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage259
dc.source.endpage260
dc.source.conferenceMaterials for Advanced Metallization - MAM
dc.source.conferencedate12/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesMD5


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