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Strained germanium quantum well pMOS FinFETs fabricated on in situ phosphorus-doped SiGe strain relaxed buffer layers using a replacement fin process
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Authors
Witters, Liesbeth
;
Mitard, Jerome
;
Loo, Roger
;
Eneman, Geert
;
Mertens, Hans
;
Brunco, David
;
Lee, Seung Hun
;
Waldron, Niamh
;
Hikavyy, Andriy
;
Favia, Paola
;
Milenin, Alexey
;
Shimura, Yosuke
;
Vrancken, Christa
;
Bender, Hugo
;
Horiguchi, Naoto
;
Barla, Kathy
;
Thean, Aaron
;
Collaert, Nadine
Conference
International Electron Devices Meeting - IEDM
Title
Strained germanium quantum well pMOS FinFETs fabricated on in situ phosphorus-doped SiGe strain relaxed buffer layers using a replacement fin process
Publication type
Proceedings paper
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