Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4

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Authors

Zhang, Liping; Ljazouli, Rami; Lefaucheux, Philippe; Tillocher, Thomas; Dussart, Remi; Mankelevich, Yuri; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl

ISSN

2162-8769

Issue

6

Journal

ECS Journal of Solid State Science and Technology

Volume

2

Title

Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4

Publication type

Journal article

Embargo date

9999-12-31

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