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Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4
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1966 since deposited on 2021-10-21
1last month
Acq. date: 2026-01-07
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Metrics
Views
1966 since deposited on 2021-10-21
1last month
Acq. date: 2026-01-07
Citations