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Effect of deposition parameters on A1:ZnO transparant conductive oxide thin films prepared by DC sputtering

dc.contributor.authorAtalay, Ahmed
dc.contributor.authorVan Gompel, Mathias
dc.contributor.authorD'Haen, Jan
dc.contributor.authorTurner, Stuart
dc.contributor.authorVan Tendeloo, G.
dc.contributor.authorHaenen, Ken
dc.contributor.authorWagner, Patrick
dc.date.accessioned2021-10-22T00:44:12Z
dc.date.available2021-10-22T00:44:12Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23506
dc.sourceIIOimport
dc.titleEffect of deposition parameters on A1:ZnO transparant conductive oxide thin films prepared by DC sputtering
dc.typeOral presentation
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewno
dc.source.conference13th International Conference on Reactive Sputter Deposition
dc.source.conferencedate11/12/2014
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - imec


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