dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Doise, Jan | |
dc.contributor.author | MKuppuswamy, Vijaya Kumar | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Chan, BT | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Cao, Yi | |
dc.contributor.author | Her, YoungJun | |
dc.date.accessioned | 2021-10-22T00:45:28Z | |
dc.date.available | 2021-10-22T00:45:28Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23529 | |
dc.source | IIOimport | |
dc.title | Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Doise, Jan | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Chan, BT | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Her, YoungJun | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Chan, BT::0000-0003-2890-0388 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 92310R | |
dc.source.conference | 30th European Mask and Lithography Conference - EMLC | |
dc.source.conferencedate | 24/06/2014 | |
dc.source.conferencelocation | Dresden Germany | |
dc.identifier.url | http://spie.org/Publications/Proceedings/Paper/10.1117/12.2066647 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 6231 | |