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Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors
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Authors
Buhler, Rudolf
;
Eneman, Geert
;
Favia, Paola
;
Bender, Hugo
;
Vincent, Benjamin
;
Hikavyy, Andriy
;
Loo, Roger
;
Martino, Joao
;
Claeys, Cor
;
Simoen, Eddy
;
Collaert, Nadine
;
Thean, Aaron
Conference
E-MRS Spring Meeting Symposium X: Materials Research for Group IV Semiconductors
Title
Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors
Publication type
Meeting abstract
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