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Plasma etching of organic low-dielectric-constant polymers: comparative analysis

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorAlaerts, Carine
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T11:25:51Z
dc.date.available2021-09-30T11:25:51Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2364
dc.sourceIIOimport
dc.titlePlasma etching of organic low-dielectric-constant polymers: comparative analysis
dc.typeProceedings paper
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage247
dc.source.endpage252
dc.source.conferenceLow Dielectric Constant Materials and Applications in Microelectronics IV
dc.source.conferencedate14/04/1998
dc.source.conferencelocationSan Francisco,CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol.511


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