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Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorZhang, Liping
dc.contributor.authorHeyne, Markus
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorHeylen, Nancy
dc.contributor.authorCiofi, Ivan
dc.contributor.authorWen, Liang Gong
dc.contributor.authorWilson, Chris
dc.contributor.authorRutigliani, Vito
dc.contributor.authorDecoster, Stefan
dc.contributor.authorSavage, Travis
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T01:06:44Z
dc.date.available2021-10-22T01:06:44Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23708
dc.sourceIIOimport
dc.titleCryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
dc.typeMeeting abstract
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageEM-TuM-6
dc.source.conferenceAVS 61st International Symposium and Exhibition
dc.source.conferencedate9/11/2014
dc.source.conferencelocationBaltimore, MD USA
imec.availabilityPublished - open access
imec.internalnoteshttp://www.avs.org/Meetings-Exhibits/Symposium/Information


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