Show simple item record

Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorGoodyear, Andy
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T01:08:13Z
dc.date.available2021-10-22T01:08:13Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23717
dc.sourceIIOimport
dc.titlePhotoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
dc.typeMeeting abstract
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip Processes in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
30451.pdf
Size:
2.204Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record