Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

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Authors
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan
Conference
Plasma Etch and Strip Processes in Microtechnology - PESM
Title
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
Publication type
Meeting abstract
Embargo date
9999-12-31
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