Publication:

Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

Date

2014
Meeting abstract
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30451.pdf 2.2 MB

Author(s)

De Schepper, Peter  
;
Altamirano Sanchez, Efrain  
;
Goodyear, Andy
;
El Otell, Ziad  
;
de Marneffe, Jean-Francois  
;
De Gendt, Stefan  

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