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The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHansen, Terje
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T01:08:33Z
dc.date.available2021-10-22T01:08:33Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23719
dc.sourceIIOimport
dc.titleThe influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment
dc.typeMeeting abstract
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced Lithography
dc.source.conferencedate22/02/2014
dc.source.conferencelocationSan Jose, CA USa
imec.availabilityPublished - imec


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