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Hydrogen plasma treatment: the evolution of roughness in frequency domain

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T01:09:04Z
dc.date.available2021-10-22T01:09:04Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23722
dc.sourceIIOimport
dc.titleHydrogen plasma treatment: the evolution of roughness in frequency domain
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90540C
dc.source.conferenceAdvanced Etch Technology for Nanopatterning III
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9054


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