Show simple item record

Defects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching technique

dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorLoo, Roger
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorShimura, Yosuke
dc.contributor.authorNuytten, Thomas
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-22T01:17:03Z
dc.date.available2021-10-22T01:17:03Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23764
dc.sourceIIOimport
dc.titleDefects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching technique
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageJ38
dc.source.conferenceE-MRS Fall meeting Symposium J: Alternative Semiconductor Integration in Si Microelectronics
dc.source.conferencedate15/09/2014
dc.source.conferencelocationWarsaw Poland
dc.identifier.urlhttp://www.emrs-strasbourg.com/index.php?option=com_abstract&task=view&id=276&day=2014-09-15&year=2014&Itemid=&id_season=12
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
29996.pdf
Size:
31.90Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record