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dc.contributor.authorDuan, M.
dc.contributor.authorZhang, J. F.
dc.contributor.authorJi, Z.
dc.contributor.authorZhang, W.
dc.contributor.authorKaczer, Ben
dc.contributor.authorSchram, Tom
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorThean, Aaron
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorAsenov, A.
dc.date.accessioned2021-10-22T01:19:26Z
dc.date.available2021-10-22T01:19:26Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23775
dc.sourceIIOimport
dc.titleTime-dependent variation: A new defect-based prediction methodology
dc.typeProceedings paper
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage2
dc.source.conferenceIEEE VLSI Technology Symposium
dc.source.conferencedate9/06/2014
dc.source.conferencelocationHonolulu, HI US
dc.identifier.urlhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6894373
imec.availabilityPublished - imec


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