Plasma cryoetching processes for silicon and advanced materials

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Authors
Dussart, R.; Tillocher, T.; Gosset, N.; Vital, A; Lefaucheux, P.; L'jazouli, R; Boufnichel, M.; Vayer, M.; Sinturel, C.; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Nishimura, E.; Yatsuda, K.; Maekawa, K.
Conference
International Conference on Microelectronics and Plasma Technology - ICMAP
Title
Plasma cryoetching processes for silicon and advanced materials
Publication type
Meeting abstract
Embargo date
9999-12-31
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