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Experimental validation of rigorous, 3D profile models for negative-tone develop resists

dc.contributor.authorGao, Weimin
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorKamohara, Itaru
dc.contributor.authorSchmoeller, Thomas
dc.contributor.authorLucas, Kevin
dc.contributor.authorDemmerle, Wolfgang
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMailfert, Julien
dc.date.accessioned2021-10-22T01:33:18Z
dc.date.available2021-10-22T01:33:18Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23837
dc.sourceIIOimport
dc.titleExperimental validation of rigorous, 3D profile models for negative-tone develop resists
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorMailfert, Julien
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90520C
dc.source.conferenceOptical Microlithography XXVIII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857372
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9052


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