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Readying directed self-assembly for patterning in semiconductor manufacturing

dc.contributor.authorGronheid, Roel
dc.contributor.authorChan, BT
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorMKuppuswamy, Vijaya Kumar
dc.contributor.authorDoise, Jan
dc.contributor.authorBekaert, Joost
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorNealey, Paul
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.contributor.authorSayan, Safak
dc.contributor.authorParnell, Doni
dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorSomervell, Mark
dc.date.accessioned2021-10-22T01:45:40Z
dc.date.available2021-10-22T01:45:40Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23885
dc.sourceIIOimport
dc.titleReadying directed self-assembly for patterning in semiconductor manufacturing
dc.typeMeeting abstract
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorHer, YoungJun
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewno
dc.source.beginpagena
dc.source.conference58th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN
dc.source.conferencedate27/05/2014
dc.source.conferencelocationWashinton DC USA
imec.availabilityPublished - imec


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