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Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

dc.contributor.authorGronheid, Roel
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorParnell, Doni
dc.contributor.authorChan, BT
dc.contributor.authorLee, Yu-tsung
dc.contributor.authorVan Look, Lieve
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.contributor.authorLin, Guanyang
dc.contributor.authorHarukawa, Ryoto
dc.contributor.authorNagaswami, Venkat
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorSomervell, Mark
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-22T01:46:00Z
dc.date.available2021-10-22T01:46:00Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23886
dc.sourceIIOimport
dc.titleDefect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorHer, YoungJun
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.beginpage904905
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate24/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1852186
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9049


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