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Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)

dc.contributor.authorKearney, Patrick
dc.contributor.authorWood, Obert
dc.contributor.authorHendrickx, Eric
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorSoichi, Inoue
dc.contributor.authorGoodwin, Frank
dc.contributor.authorWurm, Stephan
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorKaiser, Winfried
dc.date.accessioned2021-10-22T02:33:13Z
dc.date.available2021-10-22T02:33:13Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24046
dc.sourceIIOimport
dc.titleDriving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90481O
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography V
dc.source.conferencedate24/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2048397
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9048


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