Show simple item record

Manufacturability improvements in EUV resist processing towards NXE:3300 processing

dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorShimoaoki, Takeshi
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGoethals, Mieke
dc.contributor.authorShimura, Satoru
dc.date.accessioned2021-10-22T02:46:07Z
dc.date.available2021-10-22T02:46:07Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24084
dc.sourceIIOimport
dc.titleManufacturability improvements in EUV resist processing towards NXE:3300 processing
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage905108
dc.source.conferenceAdvances in Patterning Materials and Processes XXXI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/ProceedingBrowse.aspx#VolumeNo
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9051


Files in this item

Thumbnail
Name:
27758.pdf
Size:
690.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record