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Laser thermal anneal of polysilicon channel to boost 3D memory performance

dc.contributor.authorLisoni, Judit
dc.contributor.authorArreghini, Antonio
dc.contributor.authorCongedo, Gabriele
dc.contributor.authorToledano Luque, Maria
dc.contributor.authorToqué-Trésonne, Inès
dc.contributor.authorHuet, Karim
dc.contributor.authorCapogreco, Elena
dc.contributor.authorLiu, Lifang
dc.contributor.authorTan, Chi Lim
dc.contributor.authorDegraeve, Robin
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-22T03:08:46Z
dc.date.available2021-10-22T03:08:46Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24147
dc.sourceIIOimport
dc.titleLaser thermal anneal of polysilicon channel to boost 3D memory performance
dc.typeProceedings paper
dc.contributor.imecauthorArreghini, Antonio
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecArreghini, Antonio::0000-0002-7493-9681
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage24
dc.source.endpage25
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate9/04/2014
dc.source.conferencelocationHonolulu, HI US
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6894346&contentType=Conference+Publications
imec.availabilityPublished - open access


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