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High-k dielectrics and high work function metals for hybrid floating gate NAND flash applications

dc.contributor.authorLisoni, Judit
dc.contributor.authorBreuil, Laurent
dc.contributor.authorBlomme, Pieter
dc.contributor.authorDe Stefano, Francesca
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-22T03:09:08Z
dc.date.available2021-10-22T03:09:08Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24148
dc.sourceIIOimport
dc.titleHigh-k dielectrics and high work function metals for hybrid floating gate NAND flash applications
dc.typeProceedings paper
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorDe Stefano, Francesca
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage281
dc.source.endpage291
dc.source.conferenceDielectrics for Nanosystems 6: Materials Science, Processing, Reliability, and Manufacturing
dc.source.conferencedate11/05/2014
dc.source.conferencelocationOrlando, FL USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/61/2/281.abstract?sid=d1562664-be91-4d29-b0f2-d7ad4d61a6f3
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 61, Issue 2


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