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Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch

dc.contributor.authorMailfert, Julien
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-22T03:21:25Z
dc.date.available2021-10-22T03:21:25Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24181
dc.sourceIIOimport
dc.titleMetal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
dc.typeProceedings paper
dc.contributor.imecauthorMailfert, Julien
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorDe Meyer, Kristin
dc.source.peerreviewyes
dc.source.beginpage90520Q
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2046782
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9052


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