Publication:

Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch

Date

2014
Proceedings Paper
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Author(s)

Mailfert, Julien  
;
Van de Kerkhove, Jeroen  
;
De Bisschop, Peter  
;
De Meyer, Kristin  

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Abstract

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1923 since deposited on 2021-10-22
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