Publication:
Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
Date
| dc.contributor.author | Mailfert, Julien | |
| dc.contributor.author | Van de Kerkhove, Jeroen | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | De Meyer, Kristin | |
| dc.contributor.imecauthor | Mailfert, Julien | |
| dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | De Meyer, Kristin | |
| dc.date.accessioned | 2021-10-22T03:21:25Z | |
| dc.date.available | 2021-10-22T03:21:25Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24181 | |
| dc.identifier.url | http://spie.org/Publications/Proceedings/Paper/10.1117/12.2046782 | |
| dc.source.beginpage | 90520Q | |
| dc.source.conference | Optical Microlithography XXVII | |
| dc.source.conferencedate | 23/02/2014 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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