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Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
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Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
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Date
2014
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mailfert, Julien
;
Van de Kerkhove, Jeroen
;
De Bisschop, Peter
;
De Meyer, Kristin
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1914
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Acq. date: 2025-12-11
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Metrics
Views
1914
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-11
Citations