Show simple item record

Feasibility of compensating for EUV field edge effects through OPC

dc.contributor.authorMaloney, Chris
dc.contributor.authorWord, James
dc.contributor.authorFenger, Germain
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorLorusso, Gian
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHendrickx, Eric
dc.contributor.authorSmith, Bruce
dc.date.accessioned2021-10-22T03:26:00Z
dc.date.available2021-10-22T03:26:00Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24193
dc.sourceIIOimport
dc.titleFeasibility of compensating for EUV field edge effects through OPC
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90480T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1863985
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9048


Files in this item

Thumbnail
Name:
27866.pdf
Size:
7.430Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record