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15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process

dc.contributor.authorMitard, Jerome
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLoo, Roger
dc.contributor.authorLee, Seung Hun
dc.contributor.authorSun, J.W.
dc.contributor.authorFranco, Jacopo
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorBrand, A.
dc.contributor.authorLu, X.
dc.contributor.authorYoshido, N.
dc.contributor.authorEneman, Geert
dc.contributor.authorBrunco, David
dc.contributor.authorVorderwestner, M.
dc.contributor.authorStorck, P.
dc.contributor.authorMilenin, Alexey
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorWaldron, Niamh
dc.contributor.authorFavia, Paola
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorVanderheyden, Annelies
dc.contributor.authorRichard, Olivier
dc.contributor.authorMertens, Hans
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorSioncke, Sonja
dc.contributor.authorVrancken, Christa
dc.contributor.authorBender, Hugo
dc.contributor.authorEyben, Pierre
dc.contributor.authorBarla, Kathy
dc.contributor.authorLee, Sun Ghil
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-22T03:54:13Z
dc.date.available2021-10-22T03:54:13Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24266
dc.sourceIIOimport
dc.title15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process
dc.typeProceedings paper
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage138
dc.source.endpage139
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate9/06/2014
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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