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Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation

dc.contributor.authorMueller, Matthias
dc.contributor.authorHoenicke, Philipp
dc.contributor.authorDetlefs, Blanka
dc.contributor.authorFleischmann, Claudia
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBeckhoff, Burkhard
dc.date.accessioned2021-10-22T04:00:38Z
dc.date.available2021-10-22T04:00:38Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24283
dc.sourceIIOimport
dc.titleQuantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation
dc.typeMeeting abstract
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.source.peerreviewno
dc.source.beginpagena
dc.source.conferenceNanotechItaly
dc.source.conferencedate26/11/2014
dc.source.conferencelocationVenice Italy
imec.availabilityPublished - imec


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