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Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer

dc.contributor.authorNag, Manoj
dc.contributor.authorSteudel, Soeren
dc.contributor.authorBhoolokam, Ajay
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorMyny, Kris
dc.contributor.authorMass, Joris
dc.contributor.authorFritz, Thomas
dc.contributor.authorTrube, Jutta
dc.contributor.authorGelinck, Gerwin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-22T04:09:38Z
dc.date.available2021-10-22T04:09:38Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24303
dc.sourceIIOimport
dc.titleAmorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer
dc.typeOral presentation
dc.contributor.imecauthorNag, Manoj
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorMyny, Kris
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecMyny, Kris::0000-0002-5230-495X
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewno
dc.source.conference10th International Thin-Film Transistor Conference - ITC
dc.source.conferencedate23/01/2014
dc.source.conferencelocationDelft The Netherlands
imec.availabilityPublished - imec


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