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Molecular glass resists for scanning probe lithography

dc.contributor.authorNeuber, Christian
dc.contributor.authorRingk, Andreas
dc.contributor.authorKolb, Tristan
dc.contributor.authorWieberger, Floryan
dc.contributor.authorStrohriegl, Peter
dc.contributor.authorSchimdt, Hans-Werner
dc.contributor.authorFokkema, Vincent
dc.contributor.authorCooke, Mike
dc.contributor.authorRawlings, Colin
dc.contributor.authorDurig, Urs
dc.contributor.authorKnoll, Armin
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorKaestner, Marcus
dc.contributor.authorKrivoshapkina, Yana
dc.contributor.authorBudden, Matthias
dc.contributor.authorRangelow, Ivo
dc.date.accessioned2021-10-22T04:15:44Z
dc.date.available2021-10-22T04:15:44Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24317
dc.sourceIIOimport
dc.titleMolecular glass resists for scanning probe lithography
dc.typeProceedings paper
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Schepper, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90491V
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/app/submissions/Coauthors.aspx?RoleGuid=cc442354-711c-e311-a6ea-005056814748
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9049


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