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Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorChan, BT
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBayana, Hareen
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.contributor.authorLin, Guanyang
dc.contributor.authorParnell, Doni
dc.contributor.authorNafus, Kathleen
dc.contributor.authorSomervell, Mark
dc.contributor.authorHarukawa, Ryoto
dc.contributor.authorChikashi, Ito
dc.contributor.authorNagaswami, Venkat
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-22T04:37:16Z
dc.date.available2021-10-22T04:37:16Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24368
dc.sourceIIOimport
dc.titleDefect capture sensitivity in 14 nm half-pitch line/space DSA patterns
dc.typeMeeting abstract
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBayana, Hareen
dc.contributor.imecauthorHer, YoungJun
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conferenceMicro and Nano Engineering Conference - MNE
dc.source.conferencedate22/09/2014
dc.source.conferencelocationLausanne Switzerland
dc.identifier.urlhttp://www.epapers.org/mne2014/ESR/paper_details.php?PHPSESSID=gbstlqptpeob4ctmsr39kdm5q7&paper_id=8606
imec.availabilityPublished - imec


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