Show simple item record

Characterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition

dc.contributor.authorRedzheb, Murad
dc.contributor.authorArmini, Silvia
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVan der Voort, Pascalr
dc.date.accessioned2021-10-22T05:03:48Z
dc.date.available2021-10-22T05:03:48Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24428
dc.sourceIIOimport
dc.titleCharacterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition
dc.typeMeeting abstract
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewno
dc.source.conferenceConference on Science and Applications of Thin Films - SATF
dc.source.conferencedate15/09/2014
dc.source.conferencelocationIzmir Turkey
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record