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Characterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition
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Authors
Redzheb, Murad
;
Armini, Silvia
;
Baklanov, Mikhaïl
;
Van der Voort, Pascalr
Conference
Conference on Science and Applications of Thin Films - SATF
Title
Characterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition
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