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Characterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition
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1874 since deposited on 2021-10-22
Acq. date: 2025-10-23
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Views
1874 since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations