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Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control

dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorYounkin, Todd
dc.contributor.authorGronheid, Roel
dc.contributor.authorDemuynck, Steven
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorSeo, Takehito
dc.contributor.authorGuerrero, Douglas
dc.contributor.authorParnell, Doni
dc.contributor.authorMuramatsu, Makoto
dc.contributor.authorShinichiro, Kawakami
dc.contributor.authorTakashi, Yamauchi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorSomervell, Mark
dc.date.accessioned2021-10-22T05:14:59Z
dc.date.available2021-10-22T05:14:59Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24451
dc.sourceIIOimport
dc.titleEvaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
dc.typeProceedings paper
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorGuerrero, Douglas
dc.contributor.imecauthorNafus, Kathleen
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90491L
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857172
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9049


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