193nm immersion lithography for high performance silicon photonic circuits

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Authors
Selvaraja, Shankar; Absil, Philippe; Van Campenhout, Joris; Winroth, Gustaf; Murdoch, Gayle; Locorotondo, Sabrina; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Sterckx, Gunther; Lepage, Guy; Pathak, Shibnath; Bogaerts, Wim; Van Thourhout, Dries; Xie, Weiqiang
Conference
Optical Microlithography XXVII
Title
193nm immersion lithography for high performance silicon photonic circuits
Publication type
Proceedings paper
Embargo date
9999-12-31
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