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193nm immersion lithography for high performance silicon photonic circuits

dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorWinroth, Gustaf
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorMilenin, Alexey
dc.contributor.authorDelvaux, Christie
dc.contributor.authorOng, Patrick
dc.contributor.authorSterckx, Gunther
dc.contributor.authorLepage, Guy
dc.contributor.authorPathak, Shibnath
dc.contributor.authorBogaerts, Wim
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorXie, Weiqiang
dc.date.accessioned2021-10-22T05:40:19Z
dc.date.available2021-10-22T05:40:19Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24505
dc.sourceIIOimport
dc.title193nm immersion lithography for high performance silicon photonic circuits
dc.typeProceedings paper
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorSterckx, Gunther
dc.contributor.imecauthorLepage, Guy
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90520F
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Francisco, CA United States of America
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857374
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9052


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