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Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns

dc.contributor.authorSingh, Arjun
dc.contributor.authorParnell, Doni
dc.contributor.authorChan, BT
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T05:53:48Z
dc.date.available2021-10-22T05:53:48Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24533
dc.sourceIIOimport
dc.titleUsing chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns
dc.typeProceedings paper
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90492E
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857190
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9049


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