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Investigation of interactions between metrology and lithography with a CD SEM simulator

dc.contributor.authorSmith, Mark D.
dc.contributor.authorFang, Chao
dc.contributor.authorBiafore, John J.
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorRobinson, Stewart A.
dc.date.accessioned2021-10-22T06:01:18Z
dc.date.available2021-10-22T06:01:18Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24547
dc.sourceIIOimport
dc.titleInvestigation of interactions between metrology and lithography with a CD SEM simulator
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage905109
dc.source.conferenceAdvances in Patterning Materials and Processes XXXI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1854361
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9051


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