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Scaling the 3D bumps pitch from 20 to 10 μm, focusing on the wet Cu seed etch process development
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Authors
Suhard, Samuel
;
Moussa, Alain
;
Slabbekoorn, John
;
Beirnaert, Filip
;
De Preter, Inge
;
Holsteyns, Frank
Conference
Ultra Clean Processing of Semiconductor Surfaces XII - UCPSSXII
Title
Scaling the 3D bumps pitch from 20 to 10 μm, focusing on the wet Cu seed etch process development
Publication type
Proceedings paper
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