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XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-09-30T11:35:54Z
dc.date.available2021-09-30T11:35:54Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2458
dc.sourceIIOimport
dc.titleXPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; C3275


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